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Examination of flatband and threshold voltage tuning of field effect transistors by dielectric cap layers
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10.1063/1.2709642
/content/aip/journal/apl/90/9/10.1063/1.2709642
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/9/10.1063/1.2709642
/content/aip/journal/apl/90/9/10.1063/1.2709642
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/content/aip/journal/apl/90/9/10.1063/1.2709642
2007-03-01
2015-01-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Examination of flatband and threshold voltage tuning of HfO2∕TiN field effect transistors by dielectric cap layers
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/9/10.1063/1.2709642
10.1063/1.2709642
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