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Fabrication of ultrathin magnetic structures by nanostencil lithography in dynamic mode
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View: Figures


Image of FIG. 1.
FIG. 1.

(Color online) (a) Sketch displaying geometrical blurring. (b) Sketch depicting the dynamic stencil mode, where the sample has been translated by the distance maintaining a constant velocity and constant evaporation rate (in the ideal case, without geometrical blurring, i.e., and ). Both sketches are not to scale. (c) Schematic of the desired H-shaped structure, (d) FIB image of the stencil mask, with the central part enlarged in (e).

Image of FIG. 2.
FIG. 2.

(a) Noncontact-AFM image of an H-shaped structure (Fe on native silicon oxide) fabricated in the dynamic stencil mode; (b) and (c) line profiles as indicated in (a). In (b) the edge profile width is and the FWHM of the gap is .

Image of FIG. 3.
FIG. 3.

(Color online) Spin-SEM images of a structure with 30% height modulation; (a) topography and in-plane magnetization components (b) parallel and (c) perpendicular to the long side of the pads as indicated by the arrows. (d) Correlation between topography and magnetization direction is demonstrated for the area indicated in (a) and (c).


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of ultrathin magnetic structures by nanostencil lithography in dynamic mode