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Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes
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View: Figures


Image of FIG. 1.
FIG. 1.

Schematic diagram of the experimental setup. The substrate is mounted on an nanopositioning stage, and the collimated metal vapor beam is guided from the evaporator to the substrate through the apertures in the AFM cantilever. An micropositioning stage allows the positioning of the microcantilever array, which can be viewed by an optical microscope. Inset: Photography of the modified VT AFM/STM Omicron head.

Image of FIG. 2.
FIG. 2.

(a) Optical microscopy images of silicon nitride membranes with microelectrodes patterns. (b) Three-dimensional view of the microelectrodes protected by the shadow of the AFM cantilever. (c) Contact AFM image of Au microelectrodes deposited on a substrate through a static stencil mask (size: ).

Image of FIG. 3.
FIG. 3.

(a) Schematic view of the geometrical configuration of the AFM nanostencil technique. (b) Scanning electron microscopy image showing a recessed box in the rear face of AFM tip, which was first thinned down to by FIB. (c) The cross apertures are drilled in the AFM tip wall. (d) A two lines pattern with 52° angle necessary to correct the geometrical distortions due to the evaporation geometry. (e) A line of holes. (f) An interrupted slit.

Image of FIG. 4.
FIG. 4.

Noncontact AFM images of nanopatterns deposited between the microelectrodes . Imaging conditions: (a) , , scanning ; (b) , , scanning .


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes