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Mapping local strain in thin film/substrate systems using x-ray microdiffraction topography
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10.1063/1.2711189
/content/aip/journal/apl/90/9/10.1063/1.2711189
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/9/10.1063/1.2711189
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Cross-sectional transmission electron microscope image of the SiGe film edge on the Si substrate.

Image of FIG. 2.
FIG. 2.

(Color online) Schematic of the sample geometry in which the edge of the SiGe film feature is parallel to the axis.

Image of FIG. 3.
FIG. 3.

(Color online) Comparison of the experimental and calculated enhanced Si (008) intensity increase with respect to distance from the SiGe feature edge: (a) linear plot and (b) linear-log plot.

Image of FIG. 4.
FIG. 4.

(Color online) Variation of substrate normal strain in units of microstrain, as a function of and , according to the edge force model.

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/content/aip/journal/apl/90/9/10.1063/1.2711189
2007-03-02
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mapping local strain in thin film/substrate systems using x-ray microdiffraction topography
http://aip.metastore.ingenta.com/content/aip/journal/apl/90/9/10.1063/1.2711189
10.1063/1.2711189
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