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Cross-sectional transmission electron microscope image of the SiGe film edge on the Si substrate.
(Color online) Schematic of the sample geometry in which the edge of the SiGe film feature is parallel to the axis.
(Color online) Comparison of the experimental and calculated enhanced Si (008) intensity increase with respect to distance from the SiGe feature edge: (a) linear plot and (b) linear-log plot.
(Color online) Variation of substrate normal strain in units of microstrain, as a function of and , according to the edge force model.
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