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(Color online) [(a) and (b)] Illustrations of the two pillar geometry imperfections considered and (c) the staircase approximation used for the type I imperfection.
factor for (a) type I and (b) type II imperfections and (c) under influence of material loss.
factor for the optimized structure, in (a) for type I imperfection, in (b) for type II imperfection, and in (c) for type II imperfection with an artificial GaAs etch.
(Color online) Radial electric field profiles in top DBR mirror for inclination angles of (a) 0° and (b) 0.9°.
(Color online) (a) Reflectivity and (b) overlap of modes in GaAs and AlAs layers as a function of etch depth.
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