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Controlled fabrication of nanogaps by electromigration in gold and gold-palladium nanowires
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10.1063/1.2785982
/content/aip/journal/apl/91/12/10.1063/1.2785982
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/12/10.1063/1.2785982
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Figures

Image of FIG. 1.
FIG. 1.

(a) SEM image of -wide, -thick, -long Au–Pd nanowire. (b) Calculated distribution of temperature (due to Joule heating) and stress due to electromigration and Joule heating in a nanowire. The point corresponds to the center of the wire.

Image of FIG. 2.
FIG. 2.

(a) Comparison of measured (points) and calculated (curves) dependences of current and resistance vs applied voltage, showing excellent agreement. (b) Current-voltage characteristics of four Au and four Au–Pd wires to the point of failure, taken at a voltage ramp rate of .

Image of FIG. 3.
FIG. 3.

Postfailure SEM images of wires illustrating different failure regimes, (a) failure due to heating, (b) electromigration, and (c) a combination of both. Regime (c) leads to the most reliable and reproducible nanogaps.

Image of FIG. 4.
FIG. 4.

Postfailure tunneling curves for two different devices.

Image of FIG. 5.
FIG. 5.

Bin graph illustrating degree of reproducibility of gap formation.

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/content/aip/journal/apl/91/12/10.1063/1.2785982
2007-09-21
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Controlled fabrication of 1–2nm nanogaps by electromigration in gold and gold-palladium nanowires
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/12/10.1063/1.2785982
10.1063/1.2785982
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