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(Color online) AFM based anodization nanolithography generated oxide FWHM and tip-sample faradaic current as influenced by changes in relative humidity. Each data point for width (diamond) and current (star) is an average over the length of a oxide line created at bias and . Linear fitting for width (dotted) and current (solid) is displayed.
Si master patterns generated using AFM based anodization nanolithography followed by anisotropic wet etching for use as molds for polymeric stamps in soft lithography. The left image is of a pitch master (width, ; spacing, ; pitch, ) and the right is a pitch master (width, ; spacing, ; pitch, ). Areas of lighter contrast correspond to taller height.
SEM images of nanoscale SAM patterns of ODT created using with an -PDMS stamp molded from AFM created masters. The left image shows a pattern formed using a stamp molded to the master pattern of Fig. 2 while the right pattern was generated using a stamp molded to the master. Lighter areas correspond to the methyl terminated ODT SAM while the darker areas represent the Au substrate.
SEM images of nanoscale Si master with decreasing pitch of per instance from top to bottom. Areas of lighter contrast correspond to taller features. The spacing shown at the bottom of the image is .
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