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Atomic force microscope based nanofabrication of master pattern molds for use in soft lithography
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10.1063/1.2787965
/content/aip/journal/apl/91/12/10.1063/1.2787965
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/12/10.1063/1.2787965
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) AFM based anodization nanolithography generated oxide FWHM and tip-sample faradaic current as influenced by changes in relative humidity. Each data point for width (diamond) and current (star) is an average over the length of a oxide line created at bias and . Linear fitting for width (dotted) and current (solid) is displayed.

Image of FIG. 2.
FIG. 2.

Si master patterns generated using AFM based anodization nanolithography followed by anisotropic wet etching for use as molds for polymeric stamps in soft lithography. The left image is of a pitch master (width, ; spacing, ; pitch, ) and the right is a pitch master (width, ; spacing, ; pitch, ). Areas of lighter contrast correspond to taller height.

Image of FIG. 3.
FIG. 3.

SEM images of nanoscale SAM patterns of ODT created using with an -PDMS stamp molded from AFM created masters. The left image shows a pattern formed using a stamp molded to the master pattern of Fig. 2 while the right pattern was generated using a stamp molded to the master. Lighter areas correspond to the methyl terminated ODT SAM while the darker areas represent the Au substrate.

Image of FIG. 4.
FIG. 4.

SEM images of nanoscale Si master with decreasing pitch of per instance from top to bottom. Areas of lighter contrast correspond to taller features. The spacing shown at the bottom of the image is .

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/content/aip/journal/apl/91/12/10.1063/1.2787965
2007-09-20
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic force microscope based nanofabrication of master pattern molds for use in soft lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/12/10.1063/1.2787965
10.1063/1.2787965
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