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Fabrication of complex nanoscale structures on various substrates
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10.1063/1.2789735
/content/aip/journal/apl/91/12/10.1063/1.2789735
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/12/10.1063/1.2789735
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Fabrication procedure of the PVA mold.

Image of FIG. 2.
FIG. 2.

Contact angles of the UV-curable resin on (a) the PVA and (b) the quartz molds.

Image of FIG. 3.
FIG. 3.

(Color online) Overall fabrication process of multistacked dual-side patterned films using UV-curable reverse nanoimprint lithography.

Image of FIG. 4.
FIG. 4.

SEM micrographs of dual-side patterned and reverse nanoimprinted polymer film on (a) the Si wafer and (b) the glass plate.

Image of FIG. 5.
FIG. 5.

SEM micrograph of the nanostructured layer transferred to the flexible PET substrate.

Image of FIG. 6.
FIG. 6.

SEM micrograph of doubly stacked nanostructured layers on the Si wafer.

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/content/aip/journal/apl/91/12/10.1063/1.2789735
2007-09-20
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of complex nanoscale structures on various substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/12/10.1063/1.2789735
10.1063/1.2789735
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