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(Color online) Electrical resistivity results for Cu(Ru), , and pure Cu films (Ref. 5) annealed at various temperatures.
XRD and electron diffraction patterns of as-deposited Cu(Ru) and films.
XRD patterns of Cu(Ru), , and pure Cu films annealed at various temperatures.
TEM images of as-deposited Cu(Ru) (a), (b), and pure Cu (c) films.
TEM micrographs of Cu(Ru) (a) and (b) films annealed at 580 and , respectively.
(Color online) Leakage current densities of pure Cu (Ref. 4), Cu(Ru), and films on MOS structures annealed at .
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