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Fabrication process sequence for ordered nanohole array, starting with a shear-aligned bilayer of block copolymer spherical nanodomains (PI spheres in a PS matrix). A fluorine-based RIE, nonselective for PS vs PI, evenly removes the top layer. The remaining bottom layer is treated with to remove the PI, creating spherical nanovoids in a cross-linked PS matrix. A second RIE step transfers the void pattern into the Si substrate as an ordered array of holes.
Plan-view SEM image of an oriented nanohole array in Si. Shear direction for the block copolymer film template from which this array was fabricated is horizontal (from left to right). Inset in the upper left corner is the fast Fourier transform of the image, clearly showing the six first-order spots expected for an ideal hexagonal lattice.
Fabrication process sequence for an ordered metal nanodot array. The left portion of the sequence is identical to Fig. 1, except that the Si substrate is first coated with layers of polyimide and . Once the pattern is transferred through the , the RIE gas is changed to , which completely etches the polyimide but not the . Blanket metal evaporation followed by lift-off to remove excess polyimide, , and metal leaves the ordered dot array.
Plan-view SEM image of an oriented Au dot array. Inset in the upper left corner is the fast Fourier transform of the image, clearly showing the first four orders of spots expected for an ideal hexagonal lattice.
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