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Built-in electric field enhancement/retardation on intermixing
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10.1063/1.2805018
/content/aip/journal/apl/91/18/10.1063/1.2805018
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/18/10.1063/1.2805018
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Measured TE- and TM-PPL spectra for different annealing durations for samples with -, -, and cap layers experienced ICP exposure and RTA at .

Image of FIG. 2.
FIG. 2.

(Color online) Measured C-HH and C-LH blueshifts (a) and calculated diffusion lengths of group V and group III sublattices (b) vs annealing duration.

Image of FIG. 3.
FIG. 3.

(Color online) Measured XPS spectra of an as-grown InP sample and a sample after argon-ICP exposure for . The inset shows that the binding energy of shifted after ICP exposure.

Image of FIG. 4.
FIG. 4.

Schematic band diagrams for (a) , (b) , and (c) showing enhancement [(a) and (b)] or suppression (c) of the diffusion of positively charged point defects from surface to bulk under the electric field within the space charge region.

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/content/aip/journal/apl/91/18/10.1063/1.2805018
2007-10-31
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Built-in electric field enhancement/retardation on intermixing
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/18/10.1063/1.2805018
10.1063/1.2805018
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