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Self-separated freestanding GaN using a interlayer
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10.1063/1.2806912
/content/aip/journal/apl/91/19/10.1063/1.2806912
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/19/10.1063/1.2806912
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Cross-sectional SEM images at each growth step for the fabrication of the free standing GaN. (a) The formation of and GaN dots on nitride sapphire substrate at , (b) LT GaN buffer layer grown on ( dots) through the increasing the substrate temperature from , and (c) voids formed at interfaces after the HT GaN growth.

Image of FIG. 2.
FIG. 2.

(Color online) XRD diffraction patterns of ∕sapphire. (a) As grown and (b) after annealing at under ambient.

Image of FIG. 3.
FIG. 3.

(Color online) Plan view SEM images of (a) the sapphire surface after wet etching of dots∕sapphire sample showing the remained GaN dots, (b) the sapphire surface after the self-separation of the thick HT GaN showing the remaining GaN particles after the separation, and (c) XRD diffraction patterns of (a) and (b), confirming the existence of the GaN on the surface.

Image of FIG. 4.
FIG. 4.

(a) Cross-sectional SEM image of the self-separated FS GaN with about thickness and (b) low temperature PL spectra of the FS GaN showing the dominating of 3.472, DAP of 3.250, and 1LO of . The inset is the PL spectra near the band-gap showing the emission at and the exciton emission at .

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/content/aip/journal/apl/91/19/10.1063/1.2806912
2007-11-08
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Self-separated freestanding GaN using a NH4Cl interlayer
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/19/10.1063/1.2806912
10.1063/1.2806912
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