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Monolithically integrated low-loss silicon photonic wires and three-dimensional tapered couplers fabricated by self-profile transformation
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10.1063/1.2809359
/content/aip/journal/apl/91/19/10.1063/1.2809359
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/19/10.1063/1.2809359
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Process flow of fabricating silicon photonic wires: (a) deep silicon etching, (b) oxide mask removal, (c) hydrogen annealing, and (d) thermal oxidation.

Image of FIG. 2.
FIG. 2.

Scanning electron micrographs of the fabricated silicon photonic wire.

Image of FIG. 3.
FIG. 3.

(Color online) Schematic illustration of an integrated silicon wire as well as a 3D taper.

Image of FIG. 4.
FIG. 4.

Scanning electron micrographs on the cross section of the coupler at different positions.

Image of FIG. 5.
FIG. 5.

(Color online) Simulation on (a) 3D tapered coupler and the mode profiles at different positions, and (b) power distribution along the propagation in the 3D taper.

Image of FIG. 6.
FIG. 6.

(Color online) Measured insertion losses vs the silicon-wire lengths.

Image of FIG. 7.
FIG. 7.

(Color online) Measured coupler losses vs the 3D taper lengths.

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/content/aip/journal/apl/91/19/10.1063/1.2809359
2007-11-07
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Monolithically integrated low-loss silicon photonic wires and three-dimensional tapered couplers fabricated by self-profile transformation
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/19/10.1063/1.2809359
10.1063/1.2809359
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