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Ultralow equivalent oxide thickness obtained for thin amorphous layers grown on Si(001)
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10.1063/1.2811956
/content/aip/journal/apl/91/19/10.1063/1.2811956
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/19/10.1063/1.2811956
/content/aip/journal/apl/91/19/10.1063/1.2811956
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/content/aip/journal/apl/91/19/10.1063/1.2811956
2007-11-09
2014-07-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultralow equivalent oxide thickness obtained for thin amorphous LaAlO3 layers grown on Si(001)
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/19/10.1063/1.2811956
10.1063/1.2811956
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