1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Optical spectroscopic study of the interfacial formation during rf sputtering of
Rent:
Rent this article for
USD
10.1063/1.2811958
/content/aip/journal/apl/91/19/10.1063/1.2811958
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/19/10.1063/1.2811958

Figures

Image of FIG. 1.
FIG. 1.

FTIR spectra in the region: (a) as-deposited SiN film, (b) deposited in Ar atmosphere, and (c) deposited in atmosphere. The wavenumbers are highlighted by dashed lines for stoichiometric and SiN, and by continuous lines for the values found in this paper.

Image of FIG. 2.
FIG. 2.

(Color online) Cross-sectional TEM images: (a) as-deposited SiN film, (b) deposited in Ar atmosphere, and (c) deposited in atmosphere.

Image of FIG. 3.
FIG. 3.

Optical spectra of sputtering: (a) pure Ar as sputtering gas and (b) pure .

Tables

Generic image for table
Table I.

Emission lines and their transition energy levels of the , , , and detected unambiguously in the optical spectrum of an Ar discharge.

Generic image for table
Table II.

Emission lines and their energy levels of the and detected unambiguously in the optical spectrum of an discharge.

Loading

Article metrics loading...

/content/aip/journal/apl/91/19/10.1063/1.2811958
2007-11-09
2014-04-24
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Optical spectroscopic study of the SiN∕HfO2 interfacial formation during rf sputtering of HfO2
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/19/10.1063/1.2811958
10.1063/1.2811958
SEARCH_EXPAND_ITEM