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Typical AFM images of a grating. The left image is a top-down view. The scale bar is . The right image is the three-dimensional (3D) view of one part of left image showing a measured depth of .
Stylized representation of the film structure. Films are considered to be made of layer 1 composed of surfactant and silica of thickness with an electron density , and of silica layer 2 of thickness with an electron density . The in-plane spacing between micelles or pores is denoted as . For clarity, the figure shows only three layers out of the nine bilayers present in a film. Films are supported by a silicon substrate and a silica cap, and buffer layers are also introduced in the model.
Absolute reflectivity curve of the as-prepared film. The top inset gives the GISAXS pattern of the as-prepared mesostructured film. The dipping velocity of this film is . The film thickness is about .
(Color online) AFM images of a 2D hexagonal mesostructured silica film deposited on silicon wafer (a) before and (b) after etching in NaOH. The insets [both (a) and (b)] present 3D images of the central regions and provide -scale information.
(Color online) AFM images of the etched 2D hexagonal mesostructured films that were deposited on the gratings using two conditions, (a) where the film thickness, , was higher than the height of lines of grating, and (b) where the film thickness was lower, , than the height of lines of grating. The bottom right inset presents the GISAXS pattern of the orientated mesostructured film confirming the 2D hexagonal structure. The top insets [both (a) and (b)] present 3D images of the central regions and provide -scale information.
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