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Schematic of a pneumatically actuated PDMS surface-patterning device with a silicon nitride tip on a PDMS membrane.
(a) Pneumatically actuated PDMS device fabrication process: (1) cavity etching on silicon wafer; (2) ZnO and silicon nitride layers deposition and patterning; (3) spin coating the thin PDMS layer; (4) PDMS bonding with the pneumatic actuation PDMS layer; (5) PDMS device releasing.
Optical micrograph of a circular PDMS membrane with a silicon nitride tip. The inset is a close-up view of the silicon nitride tip.
(a) Lateral force microscopy (LFM) images of ODT dot array made by the pneumatically activated silicon nitride tip on the PDMS membrane at contacting times of 2 and . The temperature and the relative humidity are and 38%, respectively. (b) Characterization of the pneumatically actuated PDMS device with the nitride tip on the PDMS membrane at different contacting times.
LFM image of a three-line pattern made by the pneumatically actuated PDMS device with the silicon nitride tip using the dot matrix printing format at contact time of , , and 40% relative humidity (scanning area is 6 by ).
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