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Effects of chlorine residue in atomic layer deposition hafnium oxide: A density-functional-theory study
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10.1063/1.2756108
/content/aip/journal/apl/91/2/10.1063/1.2756108
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/2/10.1063/1.2756108
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Formation energy of (a) chlorine at the threefolded oxygen site; (b) chlorine at the interstitial site. The red curve indicates the charge state with the lowest formation energy.

Image of FIG. 2.
FIG. 2.

(Color online) Relaxed structure of (a) , 0 charged interstitial defects; (b) charged interstitial defect.

Image of FIG. 3.
FIG. 3.

(Color online) Local density of states of (a) neutral substitutional defects; (b) charged substitutional defects; (c) charged interstitial defect. Dashed vertical lines indicate the Fermi level.

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/content/aip/journal/apl/91/2/10.1063/1.2756108
2007-07-09
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of chlorine residue in atomic layer deposition hafnium oxide: A density-functional-theory study
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/2/10.1063/1.2756108
10.1063/1.2756108
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