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High speed atomic force microscope lithography driven by electrostatic interaction
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10.1063/1.2756138
/content/aip/journal/apl/91/2/10.1063/1.2756138
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/2/10.1063/1.2756138
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) In situ AFM topography and SKFM images of the area rubbed with a naked tip on substrate [(A) and (B)] and on substrate modified with SWCNT network [(C) and (D)], and AFM images after translating ZnO nanoparticles on the corresponding substrates [(E) and (F)]. The tip patterned area was marked in F. The RH was 35% and the rubbing speed of the tip was .

Image of FIG. 2.
FIG. 2.

(Color online) Two- and three-dimensional topographic AFM images of the patterned ZnO nanoparticles by AFM at 30% RH. (B) Magnification of the marked area in (A). The translation rates were in pattern A and in patterns C and D.

Image of FIG. 3.
FIG. 3.

(Color online) AFM topography images illustrating the translation rate (A) and the relative humidity (B) dependence of the patterns formation of ZnO nanoparticles by AFM. The RH was 40% in A and the translation rate was in B.

Image of FIG. 4.
FIG. 4.

(Color online) Schematic illustration of the tip movement in the area with trenches or steps (A) and AFM topography images illustrating the effects of surface topography on the AFM writing process of ZnO nanoparticles [(B)–(D)]. The translating rate was in patterns B and C and in pattern D. The depths of the trenches and step were .

Image of FIG. 5.
FIG. 5.

(Color online) Patterns of various nanoparticles drawn on surfaces by AFM. [(A) and (B)] AFM topography images showing square patterns of Au nanoparticles and clusters, respectively. (C) Topography and cross-section AFM images illustrating the line pattern of monolayered clusters. (D) AFM topography (upper) and corresponding fluorescence (lower) images showing square patterns of CdTe nanoparticles. The translating rate was in patterns A and B, in pattern C, and in pattern D. The RH was 30%.

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/content/aip/journal/apl/91/2/10.1063/1.2756138
2007-07-13
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High speed atomic force microscope lithography driven by electrostatic interaction
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/2/10.1063/1.2756138
10.1063/1.2756138
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