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(Color online) Schematic diagram of numerically controlled microplasma tool used for nonlithographic patterning of Ag/glass substrates.
(a) SEM micrograph of a four hole array sputtered for by the microplasma tool with a center-to-center distance of . (b) SEM micrograph of a single hole in the four hole array. The inset shows a close-up image of the surface morphology in the sputtered hole.
(Color online) (a) SERS spectra of CV on patterned and bare Ag/glass substrates and CV on bare Ag/glass substrate. Integration times for signal collection were for the patterned substrate and for the bare substrate. Raman spectrum of pure methanol is also shown for comparison. (b) SERS spectra for various concentrations of CV on a patterned Ag/glass substrate. Integration times for signal collection were for and CV and for , , and CV.
(Color online) SERS intensity map of a single hole sputtered for by the microplasma tool. To obtain the false color image, the laser beam was scanned across an area of in steps. The color is proportional to the integrated intensity of the Raman band centered at for CV. The inset shows an optical image of the same hole acquired with a charge coupled device detector reduced by a factor of 4.
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