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AFM topography image taken after a grid on a thick film thermally grown on a Si substrate.
(Color online) Five superposed nanometric characteristics measured by C-AFM on a MIM structure.
(Color online) Cumulative probability of breakdown for thick on TiN, comparing macro—(standard capacitors) and nanotesting (C-AFM). Lines are fits to a Weibull distribution [Eq. (1)].
(Color online) Weibull plot of the breakdown electric field distribution for and for different surface areas of testing, normalized to the largest area .
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