banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Effect of optical lithography patterning on the crystalline structure of tunnel junctions
Rent this article for
View: Figures


Image of FIG. 1.
FIG. 1.

XRD microbeam data recorded on a junction, identifying the different structures/layers. The inset shows schematically the diffraction geometry.

Image of FIG. 2.
FIG. 2.

(Color online) Color intensity maps (left) and the three-dimensional corresponding representation (right) of a junction. All the intensities were normalized. From top to bottom, positions corresponding to Co(0002), , and Pt(222) interplane spacing were imaged (Bragg angles of 25.57°, 33.52°, and 51.33°, respectively). The black line square contour (left column) represents the exact size of the junction. The smearing along one direction in the maps comes from a smeared footprint of the beam (due to the incident angle ) in this direction only. The dotted line shows the scanning direction (Fig. 3).

Image of FIG. 3.
FIG. 3.

(Color online) The values for square junctions of sizes of 50 (●), 20 (◼), and are reported. (Bottom) Measured integrated intensity of the Co peak function of the lateral position of the x-ray spot on the junction is shown by the symbols. The continuous line is the calculated convolution of a square junction with the beam footprint. In the case of the junction, only half of it was measured (●); the symmetric data are shown by the open symbols (○). (Top) Angular shift of peak’s c.m., across the junction. (Inset) Cartoon of the tilt of the crystalline planes in the junction. The values of the shift angle for Pt, , and Co layers are reported.


Article metrics loading...


Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of optical lithography patterning on the crystalline structure of tunnel junctions