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characteristics of MIM capacitors with Hf-silicate dielectric. TiN was used as both the top and bottom electrodes. The area of the capacitor was .
(Color online) TDDB characteristics of Hf silicate measured after a postdeposition annealing (amorphous) and postdeposition annealing (crystalline).
Electric field dependence of time-dependent dielectric breakdown (TDDB) characteristics of crystalline and amorphous Hf-silicate dielectrics.
Electric field dependence of charge to breakdown characteristics of crystalline and amorphous Hf-silicate dielectrics.
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