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Electric-field-driven dielectric breakdown of metal-insulator-metal hafnium silicate
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10.1063/1.2825288
/content/aip/journal/apl/91/24/10.1063/1.2825288
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/24/10.1063/1.2825288
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

characteristics of MIM capacitors with Hf-silicate dielectric. TiN was used as both the top and bottom electrodes. The area of the capacitor was .

Image of FIG. 2.
FIG. 2.

(Color online) TDDB characteristics of Hf silicate measured after a postdeposition annealing (amorphous) and postdeposition annealing (crystalline).

Image of FIG. 3.
FIG. 3.

Electric field dependence of time-dependent dielectric breakdown (TDDB) characteristics of crystalline and amorphous Hf-silicate dielectrics.

Image of FIG. 4.
FIG. 4.

Electric field dependence of charge to breakdown characteristics of crystalline and amorphous Hf-silicate dielectrics.

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/content/aip/journal/apl/91/24/10.1063/1.2825288
2007-12-14
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electric-field-driven dielectric breakdown of metal-insulator-metal hafnium silicate
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/24/10.1063/1.2825288
10.1063/1.2825288
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