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Mechanism for zirconium oxide atomic layer deposition using bis(methylcyclopentadienyl)methoxymethyl zirconium
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10.1063/1.2824814
/content/aip/journal/apl/91/25/10.1063/1.2824814
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/25/10.1063/1.2824814
/content/aip/journal/apl/91/25/10.1063/1.2824814
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/content/aip/journal/apl/91/25/10.1063/1.2824814
2007-12-20
2014-08-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanism for zirconium oxide atomic layer deposition using bis(methylcyclopentadienyl)methoxymethyl zirconium
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/25/10.1063/1.2824814
10.1063/1.2824814
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