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Improved electrical performances of plasma-enhanced atomic layer deposited films by adopting plasma
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10.1063/1.2825272
/content/aip/journal/apl/91/25/10.1063/1.2825272
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/25/10.1063/1.2825272
/content/aip/journal/apl/91/25/10.1063/1.2825272
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/content/aip/journal/apl/91/25/10.1063/1.2825272
2007-12-17
2014-10-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar∕H2 plasma
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/25/10.1063/1.2825272
10.1063/1.2825272
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