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Evolution of boron-interstitial clusters in crystalline Si studied by transmission electron microscopy
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10.1063/1.2757145
/content/aip/journal/apl/91/3/10.1063/1.2757145
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/3/10.1063/1.2757145
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

SIMS boron profile overlapped with WBDF TEM cross-sectional view (negative images) of the as formed sample. In the inset, a higher magnified image of a BIC. A schematic of the experiment is also shown.

Image of FIG. 2.
FIG. 2.

WBDF TEM cross-sectional view (negative images) of the as formed sample further annealed at for (a) or (b) , and at for (c) or (d) .

Image of FIG. 3.
FIG. 3.

SIMS boron profile of the as formed sample further annealed at for (open squares) and at for (closed squares).

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/content/aip/journal/apl/91/3/10.1063/1.2757145
2007-07-16
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Evolution of boron-interstitial clusters in crystalline Si studied by transmission electron microscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/3/10.1063/1.2757145
10.1063/1.2757145
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