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(Color online) (a) Array of electrode pairs (scale bar: ); (b) Si NWs resting on top of Au electrode before and (c) after Ni electrodeposition (scale bar: ).
(Color online) (a) Plan view of a Si NW showing its two ends encapsulated with electrodeposited Ni (scale bar: ) and (b) inclined view of same NW (scale bar: ). [(c) and (d)] Higher magnification plan and inclined views near one of the NW-electrode junctions (scale bar: ); (e) Si NW partially encapsulated at the point where it was resting against Au electrode edge (scale bar: ) as illustrated in the inset. (f) Cantilevered Si NW extending from Ni (scale bar: ).
(Color online) Current-voltage characteristics before and after annealing for Si NW with the two ends fully encapsulated with electrodeposited Ni.
SEM image showing Ni nodule formed on the Si NW surface for heavily doped NWs when the sample was HF treated to remove surface oxide just before electrodeposition (scale bar: ).
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