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Effect of interfacial oxynitride layer on the band alignment and thermal stability of films on SiGe
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10.1063/1.2762277
/content/aip/journal/apl/91/4/10.1063/1.2762277
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/4/10.1063/1.2762277
/content/aip/journal/apl/91/4/10.1063/1.2762277
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/content/aip/journal/apl/91/4/10.1063/1.2762277
2007-07-25
2015-04-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of interfacial oxynitride layer on the band alignment and thermal stability of LaAlO3 films on SiGe
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/4/10.1063/1.2762277
10.1063/1.2762277
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