1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Dynamic scaling in ion etching of tungsten films
Rent:
Rent this article for
USD
10.1063/1.2760157
/content/aip/journal/apl/91/5/10.1063/1.2760157
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/5/10.1063/1.2760157
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

PSD functions of the external surface of an eroded tungsten film measured after equal temporal intervals (about ) of ion bombardment (solid curves). The dashed curve is the PSD function of the silicon substrate. The dotted curve shows the asymptotics of the PSD functions at large spatial frequency corresponding to a fractal-like behavior with the scaling exponent .

Image of FIG. 2.
FIG. 2.

Roughness evolution of a tungsten film during ion bombardment. The solid curve follows a power law with a scaling exponent .

Image of FIG. 3.
FIG. 3.

Illustration of the data collapse obtained using the PSD functions shown in Fig. 1.

Loading

Article metrics loading...

/content/aip/journal/apl/91/5/10.1063/1.2760157
2007-08-03
2014-04-17
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Dynamic scaling in ion etching of tungsten films
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/5/10.1063/1.2760157
10.1063/1.2760157
SEARCH_EXPAND_ITEM