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Low resistivity Ga-doped ZnO thin films of less than thickness prepared by ion plating with direct current arc discharge
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10.1063/1.2767213
/content/aip/journal/apl/91/5/10.1063/1.2767213
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/5/10.1063/1.2767213
/content/aip/journal/apl/91/5/10.1063/1.2767213
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/content/aip/journal/apl/91/5/10.1063/1.2767213
2007-08-01
2014-09-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low resistivity Ga-doped ZnO thin films of less than 100nm thickness prepared by ion plating with direct current arc discharge
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/5/10.1063/1.2767213
10.1063/1.2767213
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