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Fringe-shifting interferometric laser lithography with optical nonlinearity for micro- and nanofabrications
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10.1063/1.2767233
/content/aip/journal/apl/91/5/10.1063/1.2767233
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/5/10.1063/1.2767233
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the fringe-shifting interferometric laser lithography.

Image of FIG. 2.
FIG. 2.

Experimental setup with a femtosecond laser, a diffractive beam splitter, and a phase shifter.

Image of FIG. 3.
FIG. 3.

Absorbance of the polystyrene film used in the present study. Inset: chemical structure of polystyrene.

Image of FIG. 4.
FIG. 4.

SEM images of laser-ablated regions: (a) before and (b) after the fringe shift. Beam polarization was circular.

Image of FIG. 5.
FIG. 5.

SEM images of laser-ablated regions after the fringe shift: polarization was (a) vertical and (b) horizontal, represented by the arrows inset.

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/content/aip/journal/apl/91/5/10.1063/1.2767233
2007-07-31
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fringe-shifting interferometric laser lithography with optical nonlinearity for micro- and nanofabrications
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/5/10.1063/1.2767233
10.1063/1.2767233
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