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(Color online) rms roughness determined from AFM in a scanning area of as a function of second vacuum RTA temperature for NiGe films formed from , , and . The inset shows rms of and samples after accumulative RTA in ambient, its slightly faster increase rate with temperature may arise from its longer accumulated annealing time.
(Color online) AFM surface morphologies with the scanning area of of (a) annealed sample, it contains regularly distributed isolated islands with a rms of , and (b) annealed sample, it contains some irregularly distributed hills and grooves with a rms of .
SEM images of NiGe films formed from (a) after annealing, (b) after annealing, (c) after annealing, (d) after annealing, (e) after annealing, and (f) after annealing.
(Color online) Sheet resistance as a function of second RTA temperature for NiGe films formed from , , and . The alphabetized points correspond to the SEM images shown in Fig. 3.
High-resolution XTEM images of annealed NiGe films formed from (a) , (b) , and (c) . The component ratio determined from EDX at various locations is also shown.
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