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Enhanced thermal stability of nickel germanide on thin epitaxial germanium by adding an ultrathin titanium layer
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10.1063/1.2768203
/content/aip/journal/apl/91/5/10.1063/1.2768203
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/5/10.1063/1.2768203
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) rms roughness determined from AFM in a scanning area of as a function of second vacuum RTA temperature for NiGe films formed from , , and . The inset shows rms of and samples after accumulative RTA in ambient, its slightly faster increase rate with temperature may arise from its longer accumulated annealing time.

Image of FIG. 2.
FIG. 2.

(Color online) AFM surface morphologies with the scanning area of of (a) annealed sample, it contains regularly distributed isolated islands with a rms of , and (b) annealed sample, it contains some irregularly distributed hills and grooves with a rms of .

Image of FIG. 3.
FIG. 3.

SEM images of NiGe films formed from (a) after annealing, (b) after annealing, (c) after annealing, (d) after annealing, (e) after annealing, and (f) after annealing.

Image of FIG. 4.
FIG. 4.

(Color online) Sheet resistance as a function of second RTA temperature for NiGe films formed from , , and . The alphabetized points correspond to the SEM images shown in Fig. 3.

Image of FIG. 5.
FIG. 5.

High-resolution XTEM images of annealed NiGe films formed from (a) , (b) , and (c) . The component ratio determined from EDX at various locations is also shown.

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/content/aip/journal/apl/91/5/10.1063/1.2768203
2007-07-31
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced thermal stability of nickel germanide on thin epitaxial germanium by adding an ultrathin titanium layer
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/5/10.1063/1.2768203
10.1063/1.2768203
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