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Plasma ehnancement of metalorganic chemical vapor deposition and properties of nanostructured thin films
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10.1063/1.2768915
/content/aip/journal/apl/91/6/10.1063/1.2768915
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/6/10.1063/1.2768915
/content/aip/journal/apl/91/6/10.1063/1.2768915
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/content/aip/journal/apl/91/6/10.1063/1.2768915
2007-08-10
2014-09-15
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Plasma ehnancement of metalorganic chemical vapor deposition and properties of Er2O3 nanostructured thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/6/10.1063/1.2768915
10.1063/1.2768915
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