Full text loading...
(Color online) Cross-sectional dark-field TEM images of a multiple-layer-structure InN film recorded with (a) and (b) , respectively. The sample structure is shown at the left side. The marked regions (a) and (b) by dashed-line rectangles in Fig. 1(a) are magnified and are shown in Fig. 2. The ETD densities at lines (1)–(3) in (b) are , , and , respectively.
(Color online) Magnified TEM images of the corresponding regions (a) and (b) in Fig. 1(a).
(Color online) Experimental and simulated CBED patterns recorded for positions A–E as marked in Fig. 1(a). The thicknesses , 90, 68, 64, and for A, B, C, D, and E, respectively.
(Color online) AFM images of Mg:InN samples before and after chemical etching.
Article metrics loading...