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Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high dielectrics
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10.1063/1.2776350
/content/aip/journal/apl/91/9/10.1063/1.2776350
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/9/10.1063/1.2776350
/content/aip/journal/apl/91/9/10.1063/1.2776350
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/content/aip/journal/apl/91/9/10.1063/1.2776350
2007-08-27
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/9/10.1063/1.2776350
10.1063/1.2776350
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