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Crystalline SiGe films grown on Si substrates using laser-assisted plasma-enhanced chemical vapor deposition at low temperature
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10.1063/1.2779103
/content/aip/journal/apl/91/9/10.1063/1.2779103
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/9/10.1063/1.2779103
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Auger electron spectroscopy depth profiles of SiGe films deposited (a) with and (b) without laser assistance.

Image of FIG. 2.
FIG. 2.

Raman spectra of SiGe films deposited (a) with and (b) without laser assistance.

Image of FIG. 3.
FIG. 3.

XRD diffraction patterns of SiGe films deposited (a) with and (b) without laser assistance.

Image of FIG. 4.
FIG. 4.

High-resolution transmission electron microscopy images of SiGe films deposited (a) with and (b) without laser assistance.

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/content/aip/journal/apl/91/9/10.1063/1.2779103
2007-08-30
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Crystalline SiGe films grown on Si substrates using laser-assisted plasma-enhanced chemical vapor deposition at low temperature
http://aip.metastore.ingenta.com/content/aip/journal/apl/91/9/10.1063/1.2779103
10.1063/1.2779103
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