1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Impact of different defects on the kinetics of negative bias temperature instability of hafnium stacks
Rent:
Rent this article for
USD
10.1063/1.2828697
/content/aip/journal/apl/92/1/10.1063/1.2828697
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/1/10.1063/1.2828697
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

NBTI kinetics of Hf stacks. The threshold voltage shift, , was measured from the shift of quasi-dc transfer characteristics.

Image of FIG. 2.
FIG. 2.

A comparison of the power factor of the NBTI kinetics for Hf stacks with that for . The power factor extracted from the total given in Fig. 1 (symbol “○”) is substantially less than that of . The symbol “◼” is the power factor for obtained by using Eq. (1). The result for was taken from Ref. 4. was extracted by fitting Eq. (2).

Image of FIG. 3.
FIG. 3.

The flat-then-rise feature of NBTI kinetics for Hf stacks. The total is flat within and only starts “rise” at longer time. The symbols “◻” and “◇” were measured by using pulsed and quasi-dc , respectively. The (symbol “●”) represents the rising part of and was obtained by using Eq. (1). The stress was at room temperature.

Image of FIG. 4.
FIG. 4.

(a) Impact of temperature on NBTI kinetics of Hf stacks. The contrasting dependence on temperature indicates that different defects are responsible for the flat and rising part of . (b) A comparison of cyclic positive charging (CPC) in fresh SiON and . Although the CPC is negligible for a fresh SiON, it is considerable in a fresh .

Image of FIG. 5.
FIG. 5.

NBTI kinetics of a Hf silicate. The flat-then-rise feature is the same as that for . The open and closed symbols were obtained from pulsed and quasi-dc , respectively.

Loading

Article metrics loading...

/content/aip/journal/apl/92/1/10.1063/1.2828697
2008-01-02
2014-04-20
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Impact of different defects on the kinetics of negative bias temperature instability of hafnium stacks
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/1/10.1063/1.2828697
10.1063/1.2828697
SEARCH_EXPAND_ITEM