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Behavior of stress induced leakage current in thin films
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10.1063/1.2831693
/content/aip/journal/apl/92/1/10.1063/1.2831693
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/1/10.1063/1.2831693
/content/aip/journal/apl/92/1/10.1063/1.2831693
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/content/aip/journal/apl/92/1/10.1063/1.2831693
2008-01-10
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Behavior of stress induced leakage current in thin HfOxNy films
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/1/10.1063/1.2831693
10.1063/1.2831693
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