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Strong magnetoelectric coupling in thin-film heterostructure prepared by low energy cluster beam deposition
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10.1063/1.2831695
/content/aip/journal/apl/92/1/10.1063/1.2831695
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/1/10.1063/1.2831695
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

The surface SEM image of the Tb–Fe layer in the thin-film heterostructure. Inset (a) is a sketch of the heterostructure and inset (b) is the fractured cross-sectional SEM image of the heterostructure.

Image of FIG. 2.
FIG. 2.

(a) Polarization vs electric field hysteresis loops for the thin-film heterostructure. Inset is the variation of leakage current density with the applied electric field. (b) The field dependent magnetization curves for the thin-film heterostructure.

Image of FIG. 3.
FIG. 3.

The dependence of the induced magnetoelectric voltage increment at a given dc magnetic frequency for the thin-film heterostructure. Inset is the dependence of piezomagnetic coefficient for the pure Tb–Fe nanostructured film prepared by LECBD process.

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/content/aip/journal/apl/92/1/10.1063/1.2831695
2008-01-10
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Strong magnetoelectric coupling in Tb–Fe∕Pb(Zr0.52Ti0.48)O3 thin-film heterostructure prepared by low energy cluster beam deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/1/10.1063/1.2831695
10.1063/1.2831695
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