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Nanoscale perpendicular magnetic island arrays fabricated by extreme ultraviolet interference lithography
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View: Figures


Image of FIG. 1.
FIG. 1.

Schematic diagram of the fabrication of nanoscale magnetic island arrays with EUV-IL and corresponding SEM images of pillars with periods of (a) before and (b) after multilayer film deposition [ ].

Image of FIG. 2.
FIG. 2.

(a) SEM image of pillars with a period of . The inset shows an SEM image after multilayer film deposition [ ] with the sample tilted by 15° revealing the mushroom shape. Corresponding MFM images of magnetic island arrays after applying a vertical field and then reverse fields of (b) and (c) , respectively.

Image of FIG. 3.
FIG. 3.

(a) Map of switching fields for each individual island: the color (or grayscale on a black and white printout) corresponds to the switching field and the size is proportional to the magnetic island size for the area shown in Fig. 2(a). (b) The distribution of island diameters and (c) the distribution of remanent switching fields . The solid lines are Gaussian fits from which the array mean and sigma are determined.

Image of FIG. 4.
FIG. 4.

(a) Switching field as a function of island diameter. The error bar is the standard deviation of the switching field for each island diameter. (b) Comparison of the measured SFD as a function of island diameter (circles) with the simulated SFD (triangles) assuming only magnetostatic interactions from neighboring islands contributes to the SFD. The single data point (square) is the SFD of the entire island population.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanoscale perpendicular magnetic island arrays fabricated by extreme ultraviolet interference lithography