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Electrical properties of Be-implanted polycrystalline cubic boron nitride films
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10.1063/1.2896643
/content/aip/journal/apl/92/10/10.1063/1.2896643
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/10/10.1063/1.2896643
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Depth profiles of implanted ions simulated by SRIM2006.

Image of FIG. 2.
FIG. 2.

FTIR spectra of as-deposited, as-implanted, and RTA-treated cBN films. The implantation dose is . RTA is performed at in atmosphere for .

Image of FIG. 3.
FIG. 3.

Surface characteristic of as-deposited, as-implanted, and RTA-treated cBN films.

Image of FIG. 4.
FIG. 4.

The temperature dependence of the sheet resistance of cBN films after ion implantation and RTA.

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/content/aip/journal/apl/92/10/10.1063/1.2896643
2008-03-13
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical properties of Be-implanted polycrystalline cubic boron nitride films
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/10/10.1063/1.2896643
10.1063/1.2896643
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