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Production of high-density capacitive plasma by the effects of multihollow cathode discharge and high-secondary-electron emission
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10.1063/1.2917795
/content/aip/journal/apl/92/17/10.1063/1.2917795
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/17/10.1063/1.2917795
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Experimental apparatus and (b) construction of multihollow electrode.

Image of FIG. 2.
FIG. 2.

Plasma density and electron-neutral mean free path as a function of Ar gas pressure.

Image of FIG. 3.
FIG. 3.

Characteristics of probe current density and voltage at and for .

Image of FIG. 4.
FIG. 4.

(a) Characteristics of probe current density and voltage and (b) semilog plot of electron current density vs probe voltage at and for .

Image of FIG. 5.
FIG. 5.

Plasma density as a function of rf-biased voltage.

Image of FIG. 6.
FIG. 6.

Deposition rate of thin films and plasma density as a function of rf-biased voltage.

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/content/aip/journal/apl/92/17/10.1063/1.2917795
2008-04-28
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Production of high-density capacitive plasma by the effects of multihollow cathode discharge and high-secondary-electron emission
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/17/10.1063/1.2917795
10.1063/1.2917795
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