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Boron diffusion in amorphous silicon-germanium alloys
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10.1063/1.2919085
/content/aip/journal/apl/92/17/10.1063/1.2919085
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/17/10.1063/1.2919085

Figures

Image of FIG. 1.
FIG. 1.

SIMS profiles of B motion in the as-implanted sample and after annealing at for in , , and . SIMS profile for B in is omitted for clarity.

Image of FIG. 2.
FIG. 2.

B diffusivites for , , and at for a series of annealing times. B diffusivities for are omitted for clarity.

Image of FIG. 3.
FIG. 3.

Arrhenius plot of B diffusivities for , , , and . Annealing times ranged from 0.2 to .

Tables

Generic image for table
Table I.

Activation energy for B diffusion and diffusion coefficient from Arrhenius fits to the B diffusivity data for alloys.

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/content/aip/journal/apl/92/17/10.1063/1.2919085
2008-05-02
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Boron diffusion in amorphous silicon-germanium alloys
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/17/10.1063/1.2919085
10.1063/1.2919085
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