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Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process
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10.1063/1.2919093
/content/aip/journal/apl/92/17/10.1063/1.2919093
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/17/10.1063/1.2919093
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Figures

Image of FIG. 1.
FIG. 1.

The concept of material assisted excimer laser photoablation. (a) A layer of a porous material or carbon nanotubes is deposited on a substrate. (b) The photoablation assistor layer is coated on the target material to be patterned. The cross sectional view of in (a) is illustrated. (c) Ablation of the ablation assistor layer and removal of the target material. (d) After ablation of the ablation assistor material, it was removed and the final material patterns of the carbon nanotube film or other porous material remained.

Image of FIG. 2.
FIG. 2.

SEM photographs of carbon nanotube films. (a) Carbon nanotubes after exposure by excimer laser radiation. The initial carbon nanotubes on a quartz substrate are shown in the inset. The exposure fluence was and the number of pulses was 500. (b) The carbon nanotubes were removed during the ablation process at an incident fluence of . Inset in (b): the carbon nanotubes in the nonilluminated region.

Image of FIG. 3.
FIG. 3.

SEM photographs of residue layer in excimer laser illuminated region. (a) High-density carbon nanotube films. (b) Low-density carbon nanotube films. The incident fluence was .

Image of FIG. 4.
FIG. 4.

SEM photographs of patterned carbon nanotubes which were fabricated using an excimer laser projection imaging system. The exposure fluence was and the number of pulses was 25. (a) Pattern of carbon nanotubes around a corner shape. (b) AFM images of patterns in ablated region and nonablated region (inset).

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/content/aip/journal/apl/92/17/10.1063/1.2919093
2008-05-01
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/17/10.1063/1.2919093
10.1063/1.2919093
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