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Variation of (a) the resistivity and (b) TCR values of the thin films depending on intermixing ratios. Temperatures were varied from .
XRD patterns of thin films depending on intermixing ratios. The scan axis was mode and the scanning rate was .
Plan-view HRTEM images with SADPs of (a) sample B, (b) sample E, (c) sample F, and (d) pure thin films.
Variations in (a) TCR values and (b) XRD patterns of , pure , and TaN thin films depending on the annealing temperatures. The annealing time was fixed at regardless of annealing temperature. The symbols of ▼, ●, and ◆ denote the phases of , , and TaN, respectively.
Summary of supercycle design for the preparation of thin films.
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