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Stress-induced morphology and fine-line stability enhancement of NiSi on poly-SiGe with a buffer polycrystalline silicon interlayer
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10.1063/1.2920202
/content/aip/journal/apl/92/18/10.1063/1.2920202
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/18/10.1063/1.2920202
/content/aip/journal/apl/92/18/10.1063/1.2920202
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/content/aip/journal/apl/92/18/10.1063/1.2920202
2008-05-09
2014-12-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stress-induced morphology and fine-line stability enhancement of NiSi on poly-SiGe with a buffer polycrystalline silicon interlayer
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/18/10.1063/1.2920202
10.1063/1.2920202
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