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Power scaling of an extreme ultraviolet light source for future lithography
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10.1063/1.2924299
/content/aip/journal/apl/92/18/10.1063/1.2924299
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/18/10.1063/1.2924299
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of an EUV wafer scanner. Adapted from Ref. 3.

Image of FIG. 2.
FIG. 2.

Schematic diagram of the Philips EUV source.

Image of FIG. 3.
FIG. 3.

Experimental arrangement for the frequency scaling experiments. The two lasers operate at the same, fixed repetition rate (rep. ), while the relative timing between the pulse trains can be varied. For all experiments , which means that effectively a series of double pulses is generated. The discharge that is triggered by the second pulse (laser 2) is made under equivalent conditions as source operation at frequencies . In this way, high-frequency operation of the source can be mimicked by choosing small.

Image of FIG. 4.
FIG. 4.

Oscilloscope image measured during a frequency scaling experiment at effectively . The upper signal is the voltage on the capacitor bank, the lower signal the produced in-band EUV, measured with a (slow) photodiode.

Image of FIG. 5.
FIG. 5.

Results of frequency scaling experiments. Left: Measured EUV output power in 2 of high-frequency pulses, with and without etendue correction. Right: EUV pinhole image showing a superposition of 25 double pulse discharges at effectively .

Image of FIG. 6.
FIG. 6.

Results of pulse energy scaling experiments. Left: The measured EUV output energy in 2 per pulse (128-pulse average), with and without an etendue correction. Right: EUV pinhole image measured at input pulse energy.

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/content/aip/journal/apl/92/18/10.1063/1.2924299
2008-05-08
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Power scaling of an extreme ultraviolet light source for future lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/18/10.1063/1.2924299
10.1063/1.2924299
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