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Gray-tone lithography using an optical diffuser and a contact aligner
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10.1063/1.2924314
/content/aip/journal/apl/92/19/10.1063/1.2924314
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/19/10.1063/1.2924314
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the method (a): an optical diffuser is placed on top of the photomask during UV exposure for light blurring; example of a calibration curve (b), resist heights generate by strips with different gaps [ strip width and variable gaps (micrometers)]. The reference is the full resist step height. The feature edges are at a distance of .

Image of FIG. 2.
FIG. 2.

Profilometer scan (a) and scanning electron microscope micrographs [(b) and (c)], bird’s-eye view, of a sinusoidal thickness variation in photoresist and after RIE etching in silicon.

Image of FIG. 3.
FIG. 3.

DRIE etched silicon microlens; top-view optical micrograph of photoresist (a), optical micrograph of lens (b), and profilometer scan of photoresist and lens (c).

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/content/aip/journal/apl/92/19/10.1063/1.2924314
2008-05-13
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Gray-tone lithography using an optical diffuser and a contact aligner
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/19/10.1063/1.2924314
10.1063/1.2924314
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