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Construction of an optical wire imprinted in potassium lithium tantalate niobate by implantation
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View: Figures


Image of FIG. 1.
FIG. 1.

TRIM simulations of the implantation process for different energies of implantation. For a given dosage, the “energy to recoil” axes expresses the level of amorphization which induces the change in the RI.

Image of FIG. 2.
FIG. 2.

The 1D channel waveguide and the gold stopping mask used for its fabrication: (a) a schematic illustration of the designed channel waveguide; (b) the profile of the designed gold mask and (c) AFM picture of the gold mask following the electroplating.

Image of FIG. 3.
FIG. 3.

Microscope images of the channel waveguide that was fabricated by using the RI engineering method, (a) top view and (b) side view.

Image of FIG. 4.
FIG. 4.

The spatial distribution of light intensity at the output of the channel waveguide at : (a) the light intensity as it emerges from the channel waveguide output and (b) the light intensity of the second mode derived by computer simulation.


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Scitation: Construction of an optical wire imprinted in potassium lithium tantalate niobate by He+ implantation