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Lattice-strain control of magnetoresistivity and magnetoresistive anisotropy induced by ion-beam milling in films near the metal-insulator transition
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10.1063/1.2827192
/content/aip/journal/apl/92/2/10.1063/1.2827192
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/2/10.1063/1.2827192
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Figures

Image of FIG. 1.
FIG. 1.

(a) Ion-beam-milling experimental setup; (b) temperature dependence of the resistivity in a zero magnetic field for the ion-beam-milled films of thicknesses between 10 and ; (c) thickness dependence of the resistivity at the resistive peak; (d) thickness dependence of the metal-insulator transition temperature . The lines are guides for the eye.

Image of FIG. 2.
FIG. 2.

Magnetoresistivity (MR) measured in a magnetic field of for the ion-beam-milled films. (b) Thickness dependence of the maximum values of the MR. The lines are guides for the eye.

Image of FIG. 3.
FIG. 3.

[(a)–(b)] Temperature dependence of the magnetoresistive anisotropy for the ion-beam-milled films in a field of 0.21 and , respectively. Thickness dependence of the maximum value of the [(c)–(d)], and the [(e)–(f)] for the ion-beam-milled (both unannealed and oxygen-annealed) films and the as-grown films in fields of 0.21 and , respectively. The lines are guides for the eye.

Image of FIG. 4.
FIG. 4.

Temperature dependence of the normalized resistivity [(a)–(b)], in a zero field measured for the 10 and thick ion-beam-milled (both unannealed and oxygen-annealed) films and the as-grown films. Temperature dependence of the magneto-resistivity (MR) [(c)–(d)] and the the magneto-resistive anisotropy [(e)–(f)] of the 10 and thick ion-beam-milled (both unannealed and oxygen-annealed) films and the as-grown films in a field of .

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/content/aip/journal/apl/92/2/10.1063/1.2827192
2008-01-14
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Lattice-strain control of magnetoresistivity and magnetoresistive anisotropy induced by ion-beam milling in La0.65Ca0.35MnO3 films near the metal-insulator transition
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/2/10.1063/1.2827192
10.1063/1.2827192
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